发明名称 FORMATION OF PATTERN
摘要 PURPOSE:To form on a substrate a desired pattern constituted by a layer made of an electrically conductive material, insulating material or the like, by a method wherein while being immersed in a solvent, a stencil layer is subjected to a treatment of applying ultrasonic vibrations having a frequency of 80-200kHz. CONSTITUTION:In a step of removing a stencil layer 2 from a substrate 1 as well as removing a layer 4 on the stencil layer 2 with the removal thereof, while being immersed in a solvent, the stencil layer 2 is subjected to ultrasonic vibrations having a frequency of 80-200kHz, thereby to effectively destroy a layer 6 formed attaching to the side surfaces of the stencil layer 2. Accordingly, it is possible to effectively avoid such problems that it requires a long time to obtain a desired pattern formed by a layer 3 and that a desired pattern formed by the layer 3 is obtained with an unnecessary layer 4', residues 6', 6'', 6''' and the like left thereon. Thus, it is possible to form on the substrate 1 a desired pattern constituted by the layer 3 made of an electrically conductive material, insulating material or the like.
申请公布号 JPS5856424(A) 申请公布日期 1983.04.04
申请号 JP19810155467 申请日期 1981.09.30
申请人 NIPPON DENSHIN DENWA KOSHA 发明人 UEKI MINEO;MIMURA YOSHIAKI;YANAGAWA FUMIHIKO
分类号 G03F7/42;H01L21/027;H01L21/30;H01L21/306;H05K3/14 主分类号 G03F7/42
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