| 发明名称 |
STRIPPING COMPOSITIONS FOR PHOTORESIST MATERIALS |
| 摘要 |
Stripping compositions for removing resist materials from substrates comprise compositions of a 2-pyrrolidinone compound and a tetrahydrothiophene 1,1-dioxide compound. Either or both of polyethylene glycol and a diethylene glycol monoalkyl ether may be added to provide even more effective stripping compositions. |
| 申请公布号 |
AU8819482(A) |
申请公布日期 |
1983.03.31 |
| 申请号 |
AU19820088194 |
申请日期 |
1982.09.10 |
| 申请人 |
BAKER, J. T. CHEMICAL CO. |
发明人 |
IRL EUGENE WARD;LISA GAIL HALLQUIST;THOMAS JOSEPH HURLEY |
| 分类号 |
B41C1/00;G03F7/42 |
主分类号 |
B41C1/00 |
| 代理机构 |
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