| 摘要 |
PURPOSE:To prevent the dust infiltration into an exposing device, by providing a sample carry in-out part an automatic loader part in the adjacency to the exposing device, and containing therein a discharge electrode part and a dust collecting electrode part. CONSTITUTION:An electron beam exposing device is constituted of the exhaust system consisting of an electron gun 1, three-stage electron lenses 2-2'', movable sample base 4 and a cryopump 3, and an Si wafer 5 to be exposed is mounted on the sample base 4. In this constitution, the automatic loader part 6 is provided in the adjacency to the exposing device to load the wafer 5 on the sample base 4, gate valves 7 and 7' are respectively provided at the inlet and outlet thereof, and the electric dust collector is contained therebetween. This dust collector is constituted of the negative pole 8 of the discharge part and the positive pole 9 of the duct collecting part which are opposed each other and removes dusts in the air containing dusts coming into the loader part 6 resulting in clean air and the prevention of deposits onto the wafer 5. |
