| 摘要 |
PURPOSE:To enhance resistance to printing and heat, and spectral sensitivity, and further adhesion of an amorphous silicon photosensitive layer, by feeding reaction gas at right angles to a rotational axis and executing plasma CVD in order to prevent growth of amorphous silicon structure in the axial direction causing cracks of the amorphous silicon photosensitive layer of a cylindrical electrophotographic receptor. CONSTITUTION:A cylindrical conductive substrate 5 is mounted on a rotary support 4 coaxially in parallel to its rotating axis. A reaction gas contg. a silicon compd. is fed toward the surface of the substrate 5, and glow discharge is generated in the space surrounding the substrate 5 to form a photosensitive layer consisting of amorphous silicon on its surface. The reaction gas passes through the inside of an opposite electrode 61 having a double wall structure, and flows out of the holes provided through the inner wall, concentrating toward the substrate 5 surface, and exhausted from the upper and lower sides through an exhausting outlet 8. Since the gas does not form laminar flow moving along the substrate surface in the axial direction, growth of the a-Se layer in the axial direction is restrained, and cracking on said layer due to stress during copying or printing applied at right angles to the axial direction is prevented. |
