发明名称 SLIT EXPOSURE ILLUMINATING DEVICE
摘要 PURPOSE:To prevent intensity of illumination of a picture image from becoming ununiform, by providing one or more vertical partition plates on a reflector in the axial direction of a tubular light source, and reducing a variation of a relative illumination intensity distribution caused by a variation of a reflection factor of an original. CONSTITUTION:One or more partition plates 24a, 24b are installed respectively or to either one of reflectors 22, 23 constituting a slit exposure illuminating device vertically to a reflection surface. In this case, the partition plate 24 is constituted so that it does not become an obstacle on the optical path from a part 9 to be illuminated to a projection lens 2. According to such a constitution, a variation of intensity of illumination due to a reflection factor (rho) of the surface of an original is influenced by only a light emitting part of a light source 21, and becomes relatively small. Also, the intensity of illumination of a picture image can be made uniform by constituting the partition plate 24 of a semi- transparent material.
申请公布号 JPS5850560(A) 申请公布日期 1983.03.25
申请号 JP19810150436 申请日期 1981.09.21
申请人 MATSUSHITA DENKI SANGYO KK 发明人 OOSAKI YOSHIHARU;HORII SHIGERU;SHIGETA TERUAKI;NISHIYAMA HIDEO
分类号 G03B27/50;G03B27/54;G03G15/04 主分类号 G03B27/50
代理机构 代理人
主权项
地址