发明名称 HEAT RESISTANT PHOTORESIST FILM
摘要 PURPOSE:To obtain the titled film capable of omitting a spin-coating process by incorporating a polymer having a specific repeating unit, and a photopolymerization initiator as an essential component to the titled film, thereby making a photosensitive film to a dry film with a resist having heat-resisting property. CONSTITUTION:The titled film contains the polymer having the repeating unit shown by formula I and the photopolymerization initiator as the essential component. In formula I, X is a (2+n) valence carbon ring or heterocyclic ring, Z is imido ring, quinazolinedione or oxazinedione ring, R is a group having carbon- carbon double bond, W is a group capable of forming a ring by reacting with carbonyl group of -COOR at the time of cleaving ROH by heat-treating, (n) is 1 or 2, (m) is 0, 1 or 2, and COOR group and Z group have the inter-relationship between an ortho and a peri positions. Thus, the spin-coating process can be omitted, and all processes can be carried out by a continous-operation whereby the through-put of the titled film is improved, and the manufacturing process makes possible to automatize.
申请公布号 JPS6327834(A) 申请公布日期 1988.02.05
申请号 JP19860172625 申请日期 1986.07.22
申请人 ASAHI CHEM IND CO LTD 发明人 YOKOTA KANICHI;IKEDA AKIHIKO;AI HIDEO
分类号 C08G73/06;C08G73/10;G03F7/004;G03F7/037;G03F7/038 主分类号 C08G73/06
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