| 摘要 |
PURPOSE:To enable precise detection of light transmission or interruption due to a micro region larger than a predetermined dimension by means wherein a plurality of photoelectric conversion elements of thin film semiconductor are formed to overlie each other when viewed in the direction of movement of the sample and they are arranged at a right angle to the direction of said movement. CONSTITUTION:A transparent substrate 1 of glass carries a transparent conductive film 2 adhered thereto, on which a silicon film 3 is laid. On the top surface of the silicon thin film 3, a plurality of bent electrodes 4 are located to adjoin each other so that a photoelectric conversion element 7 is formed between each electrode 4 and the transparent conductive film 2. When the dimension of the region to be detected is smaller than the overlying width x of the adjoining elements and the width y of the electrode portion to be detected in terms of its moving direction, the projections of said region from the substrate 1 shall all be within the portion of the element 7 to be detected at a certain point of time. Therefore, the region larger than the predetermined dimension can be detected by the variation in the output signal generated at any one of the elements 7.
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