发明名称 PATTERN INSPECTING METHOD
摘要 PURPOSE:To make the automatic judgement on acceptability of inspected pattern by a method wherein substrate surface is scanned by energy rays to collect the secondary particles discharged from the substrate surfce discriminating and checking the binary signal data of the inspected pattern images depicted by the secondary particles and said data in case of depicting the inspected pattern in the specified energy region. CONSTITUTION:When an inspected substrate 12 is placed on the stage 5 of the unit to scan the surface of said substrate 12 by the electron beam 13, the secondary electrons 14 discharged from said substrate 12 are collected by the secondary electron collector 6 supplied with the potential say 200-300V. The secondary electrons are discriminated at the specified energy region in the secondary electron discriminator 8 to transmit the secondary electron signals at the energy region 17' corresponding to the aluminum wiring pattern 17 to a data convertor 9 forming the binary signal data of the inspected pattern images while these data and the depicted data 10 utilized in case of forming said pattern 17 may be checked by a computer 11 to make the judgement on acceptability of said pattern 17.
申请公布号 JPS5843534(A) 申请公布日期 1983.03.14
申请号 JP19810141546 申请日期 1981.09.08
申请人 FUJITSU KK 发明人 NAWATA KAZUMASA
分类号 H01L21/66;(IPC1-7):01L21/66 主分类号 H01L21/66
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