| 摘要 |
PURPOSE:To prevent decreased productivity due to the defect of pin hole by overlapping a pair of photo mask that are in mirror image relation so that both patterns will agree with each other and then transferring them to a body to be treated. CONSTITUTION:Because the position where a pin hole development is not always at a fixed place and the probability that pin holes overlap is very small, they are hidden by photo masks that are in mirror image relation, and a mask pattern that is transferred to a body to be treated is free of pin hole defect. In other words the pattern 3 on a reticule 1 and the pattern 3' on a reticule 2 are in mirror image relation, and this pair of reticules are overlapped with the mutual patterns matched. The light passes through the photo masks 5 and 5', and is made to converge by an optical lens 8 to form an image on a body 9 to be treated. Because the pin hole defects 7 developed on the photo mask patterns 6 and 6' are mutually shielded from the light by the dark portion patterns on the photo masks, the imagery formed on the body 9 is a pattern with the pin hole defect being corrected. |
