发明名称 CESIUM ION SOURCE
摘要 PURPOSE:To obtain an easy-to-handle cesium ion source having simple structure, by heating, fusing and evaporating the mixture of the cesium compound and the additive which will react with said compound under the high temperature to produce the metal cesium through the electron beam shocking, then the thus produced metal cesium is ionized through the electron beam shocking. CONSTITUTION:The electron generated from the filament 5 is irradiated concentrically at the tip of the emitter 2 where the field is concentrated, thus to heat the tip section. Consequently the mixture of the cesium compound and the additive for composing the emitter will be fused at the tip section and evaporated. In this process the cesium compound and the additive will react to produce cesium which is further irradiated with the electron beam and ionized. The cesium ion is taken out by the take-out electrode 3 and taken out as the ion beam from the opening of the cathode.
申请公布号 JPS5842149(A) 申请公布日期 1983.03.11
申请号 JP19810139261 申请日期 1981.09.04
申请人 NIPPON DENSHI KK 发明人 SHIMIZU RIYUUICHI;ANAZAWA NORIMICHI
分类号 H01J37/08;H01J27/22;H01J27/26 主分类号 H01J37/08
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