发明名称 DEVELOPMENT FOR PHOTOSENSITIVE COPYING LAYER EXPOSED
摘要 In the development of exposed light-sensitive reproduction layers using an aqueous electrolyte developer the parts of the layer corresponding to the non-image areas are removed by electrochemical treatment. An electrolyte is used which has a pH in the range from 2.0 to 10.0 and contains at least one salt in a concentration of 0.1 weight percent up to the saturation limit of the solution for the particular salt. The electrolyte may also contain 0.1 to 5 weight percent surfactant.
申请公布号 JPS5842042(A) 申请公布日期 1983.03.11
申请号 JP19820146306 申请日期 1982.08.25
申请人 HOECHST AG 发明人 ENGERUBERUTO PURIIFUKE
分类号 G03F7/00;G03F7/30 主分类号 G03F7/00
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