AUTOMATIC SHEET FED TYPE PLASMA REACTION TREATMENT DEVICE

摘要

PURPOSE:To minimize a variation in treatment and damage to a wafer and to reduce treatment time as well by a method wherein a pair of open and closed type transferring wire conveyors are used instead of a belt conveyor when a semiconductor wafer is sent to a plasma reaction treatment chamber. CONSTITUTION:Treated wafers stacked in a wafer cassette 10 are taken out one by one from the bottom by an elevator 11 and are mounted on a temporary mounting stand 6 elevating by placing on a transferring conveyor 13. At that time, a scissor-type wire conveyor 9 opened and closed by an elevating cylinder 14 is opened and a treatment table 5 elevated by a cylinder 8 is inserted in the scissor-type wire conveyor 9 while transferring the wafer to the table 5 and the table 5 is further elevated to engage with the lower face of a plasma treatment reaction chamber 1. Next, an electrode 2 in the chamber 1 is descended to grasp the wafer and after applying predetermined treatment, the table 5 is descended with the wafer and the scissor-type conveyor 9 is closed to hold the wafer and the treated wafer is accommodated in a cassette 10' through the transferring conveyor 13' and the elevator 11'.