发明名称 LIQUID PHASE EPITAXY GROWING APPARATUS
摘要 PURPOSE:To prevent the adhesion of dust to the surface of a substrate by preventing the circulation of an pitaxial growth solution by means of a plate, movable in both directions, to block up a hole at the bottom of a substrate retaining apparatus. CONSTITUTION:A liquid phase epitaxial growth apparatus is composed of a solution container 30 for an epitaxial growth solution 24, a substrate retaining apparatus 25 which has an outlet 28 and an inlet 29 for the solution 24 and accommodates a growth substrate 26, a slider 23 which flows the solution 24 into the apparatus 25 by moving within the container 30 and a partition board 32 movably positioned at the bottom of the substrate retaining apparatus 25. At the start of the liquid phase epitaxial growth the partition board 32 operates to close the solution outlet 28 so as to retain the solution 24 flowed into the apparatus 25, while at the end of the epitaxial growth it moves in concert with the slider 23 to open the outlet 28 so that the solution 24 in the apparatus 25 may be flowed into the solution container 30.
申请公布号 JPS5837920(A) 申请公布日期 1983.03.05
申请号 JP19810136469 申请日期 1981.08.28
申请人 MITSUBISHI DENKI KK 发明人 ODA TAKAO;YOSHIDA SUSUMU;MITSUI KOUTAROU;YOSHIDA MASAHIRO
分类号 H01L21/208;C30B19/06;(IPC1-7):01L21/208 主分类号 H01L21/208
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