| 摘要 |
PURPOSE:To exactly form the pattern of semiconductor elements with respect to a wafer, by detecting the orientation flat of the wafer by using a specified control pattern formed on a photomask to position the mask accurately. CONSTITUTION:A control pattern 15 consisting of plural parallel lines l1-l4 at prescribed minute intervals on the prescribed part of a photomask proper 13. A sign 14 represents a pattern for forming semiconductor elements. Said photomask 15 is placed on a wafer 11 so that the orientation flat of the wafer 11 comes to the part of the control pattern 15, and the wafer 11 and the mask 13 are relatively rotated so that the flat 12 does not intersect any line l1-l4, thus permitting the flat 12 to be set in parallel to the pattern 14. |
