| 发明名称 |
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| 摘要 |
A metallic foil is laminated to a transparent substrate with a photopolymerizable adhesive. An outer layer of photoresist is used in etching a pattern in the foil. The etched foil itself is then used as a resist in the complete removal of the uncovered portions of the adhesive, leaving the transparency of the revealed substrate material totally unimpaired. Finally, the remaining adhesive is hardened by polymerization resulting from exposure to ultraviolet light passed through the substrate from the unlaminated side. |
| 申请公布号 |
JPS637476(B2) |
申请公布日期 |
1988.02.17 |
| 申请号 |
JP19800130025 |
申请日期 |
1980.09.18 |
| 申请人 |
YOKOGAWA HYUURETSUTO PATSUKAADO KK |
发明人 |
ROORENSU II BURAUN;JEEMUSU ERU BAUAA;JERARUDO DABURYU SHETSUKU |
| 分类号 |
B60S1/02;C23F1/02;G01B11/00;G01B11/03;G03F7/00;H05K1/16;H05K3/00;H05K3/06;H05K3/38 |
主分类号 |
B60S1/02 |
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代理人 |
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