| 摘要 |
The invention relates to a method for producing a pattern plane (5, 15) on a metallised substrate (2, 3), the pattern plane being planar after the build-up of metallic patterns by electroplating, and the patterns (5, 15) being generated by means of photolithography and built up by electrodeposition. In order to achieve a planar surface, the photolithographic process (4, 14, 24) is used at the same time to generate the masking for generating the metallic patterns (5, 15) and for filling the gaps (24, 27) between the individual micropattern parts (5, 15) of a plane with organic or inorganic dielectric material. The masking layer (24, 27) remains on the substrate. The method is used in the producing of patterned nickel-iron planes and conductor track planes in multitrack magnetic heads having read-write elements built up by means of thin-film technology. <IMAGE>
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