| 摘要 |
PURPOSE:To form a highly accurate film with the desired shape of exposed surface without giving any damage on the substrate by providing thick double layers on the substrate surface and forming it to the prescribed thickness by irradiating the accelerated ion to such layer. CONSTITUTION:The first film 3 is formed on the region where the concave and convex portions of substrate 1 are deposited. Since the first film 3 is formed almost in the equal thickness, the exposed main surface 301 shows the concave and convex surface along the concave and convex shape of the substrate surface. The second film 4 is formed on the main surface 301 of the first film 3. The second film 4 is the positive photo resist film deposited by the rotating coating method. The positive type photo resist increases fluidity when it is heated up to a temperature of about 160-180 deg.C and flows by itself, making small the concave and convex shape. Then, the accelerated ion is irradiated to the exposed surface of the second film 4 and impact of such irradiation removes the convex portion of entire part of the second film 4 or a part of the first film 3. It is desirable to execute this process by the ion beam milling method. |
