| 摘要 |
PURPOSE:To reduce greatly the alignment error, by performing the positioning previously to plural transcription regions on a wafer before the transcription, storing the information on the matching position and then controlling a shifting device during the transcription and based on the above-mentioned information. CONSTITUTION:For an exposure system of the step-and-repreat system, a mask 25 is positioned at the lower part of an alignment optical system 40 before the transcription. Then the shift of rotation between the mask 25 and the xy direction of the stages 7 and 11 of (x) and (y) axes is compensated by means of the system 40. A wafer 15 is set on a wafer stage 14, and the mask 25 is positioned to each of plural transcription regions on the wafer 15 with use of the marks provided to the mask 25 and the wafer 15. Then the information on the matching position is stored. In the transcription mode, the mask 25 is positioned at the lower part of a light source 46. Then the shift of the stages 11 and 7 is controlled based on the above-mentioned information to perform the transcription successively. |
