发明名称 VACUUM DEPOSITING METHOD
摘要 PURPOSE:To obtain a deposited film free from film defectes such as pinholes and blister by putting an evaporating material in the recess of a heating element, covering the surface of the material with a porous layer, and carrying out deposition. CONSTITUTION:A heating element provided with a recess such as a boat-shaped heater is used, and an evaprating material such as W or Mo is put in the recess. The evaporating material is covered with a porous layer such as porous plate or a layer of wool, cloth or coarse powder, and it is evaporated by an ordinary method. The preferred porosity of the porous layer is 10-30%. The porous layer acts as a buffer which absorbs the ununiformly evaporated material once and radiates it in an evaporation space in a uniform state.
申请公布号 JPS5827980(A) 申请公布日期 1983.02.18
申请号 JP19810125295 申请日期 1981.08.12
申请人 TOKYO SHIBAURA DENKI KK 发明人 KOIZUMI HIDEO
分类号 C23C14/24 主分类号 C23C14/24
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