发明名称 SUBSTRATE FOR THIN FILM TRANSISTOR
摘要 PURPOSE:To prevent the diffusion of an impurity to a semiconductor film by applying an electric field to a substrate which has impurity ions such as glass and ceramics, segregating the impurity contained in the substrate at one side of the substrate and forming a one-sided segregated layer. CONSTITUTION:An electrode 2 is provided on a substrate 1 which has impurity ions such as glass and ceramics and a high voltage is applied from a power source 3. Thus, the ions are segregated at one side of the substrate 1 due to the electric field by a high voltage, thereby forming a segregated layer 4 which includes muc impurity. This layer 4 is removed by lapping or the like, thereby preventing the diffusion of the impurity to the semiconductor film.
申请公布号 JPS5827367(A) 申请公布日期 1983.02.18
申请号 JP19810125471 申请日期 1981.08.11
申请人 CITIZEN TOKEI KK 发明人 SEKIGUCHI KANETAKA
分类号 H01L21/86;H01L27/12;H01L29/78;H01L29/786 主分类号 H01L21/86
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