摘要 |
<p>Process comprises a mixture of >=2 reacting components, one of which is admitted into the reactor in gaseous phase and subjected to IR laser radiation at a wavelength >2 mu m and intensity >40 W/cm2, heating the gas to a temp. below the normal thermal reaction temp. and bringing the other component(s) into reactive contact. The reaction mixt. contains a chemically inert gas sensitive to the transferring the IR radiation. The laser generator can be based on CO2 gas, generating radiation at 10.6 mu m. The residence time in the reactor is 3 m. sec. - 1 sec. depending on reaction temp. and radiation intensity.</p> |