发明名称 MANUFACTURING DEVICE
摘要 PURPOSE:To evade the occurrence of inferior products by a method wherein two or more checking devices are mechanically constructed in one, each of which is connected to a computer that analyzes the cause for the inferior products, then based on this cause, the preceding process of semiconductor manufacturing system is automatically controlled. CONSTITUTION:A magazine 7 that stores a number of wafers 4 at the lower stream of the thin film forming process 3 is installed, therefrom wafers 4 are transferred one by one by a transport track 8 to a foreign matter checking device 1 that consists of a sample bed 5, an optical system 6 and an XY table 9. Next, the checked wafer 4 is sent by a track 12 to a film thickness checking device 2 which consists of a sample bed 10 and a film thickness measuring device 11, being stored in a magazine after its film thickness checked. Then a signal from the optical system 6 and the measuring device 11 is stored into a magnetic memory 17. A computer 18 reads out this signal, analyzes the existence of a foreign matter or inferior film thickness by comparing the signal with a designated program, and stops the preceding process to the process 3.
申请公布号 JPS5825243(A) 申请公布日期 1983.02.15
申请号 JP19810122993 申请日期 1981.08.07
申请人 HITACHI SEISAKUSHO KK 发明人 AKIBA MASAKUNI;NAGATOMO HIROTO
分类号 G01R31/26;H01L21/66;(IPC1-7):01L21/66 主分类号 G01R31/26
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