| 摘要 |
An improved IC printer which projects the pattern of an integrated circuit from a mask to form an image on a wafer includes a pair of similar illuminating optical systems arranged symmetrically with respect to a single light source and which are thermally isolated therefrom. One of the illuminating optical systems is used for illuminating the wafer when aligning the mask and wafer, the other is used for illuminating the mask when projecting the pattern of the mask on the wafer.
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