Process for fabricating a high capacity memory cell

摘要

A method of fabricating an array of high capacity memory cells comprises forming a transfer gate over each cell area spaced from an adjacent isolation region to define a storage region in the semiconductor surface between the transfer gate and isolation region and to define a bit line region on the other side of the transfer gate; forming a shallow ion layer of first conductivity type in the storage region self-aligned with the transfer gate; forming a deep ion layer of opposite conductivity type in the storage region self-aligned with the transfer gate; forming a storage gate over a portion of the storage region spaced laterally from the transfer gate to form a gap between the storage and transfer gates; and introducing ions of the first conductivity type into the portion of the storage region defined by the gap to at least neutralize some ions in the deep ion layer.