| 发明名称 |
Plasma etching of aluminum |
| 摘要 |
A method of improving the uniformity and line-width control in the plasma etching of aluminum and its alloys by adding to the etchant gas an effective amount of a gaseous hydrocarbon which will polymerize under glow discharge conditions.
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| 申请公布号 |
US4372807(A) |
申请公布日期 |
1983.02.08 |
| 申请号 |
US19820362041 |
申请日期 |
1982.03.25 |
| 申请人 |
RCA CORPORATION |
发明人 |
VOSSEN, JR., JOHN L.;HALON, BERNARD |
| 分类号 |
C23F4/00;H01L21/3213;(IPC1-7):C23F1/02 |
主分类号 |
C23F4/00 |
| 代理机构 |
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