| 摘要 |
PURPOSE:To provide a thermal head wherein the positional accuracy of a heat generating part is enhanced and heat generating efficiency is excellent, by selectively forming a projected film thicker than an electrode film between a glaze layer and the heat generating part of a heat generating resistor film using a vapor deposition mask. CONSTITUTION:A glaze layer 2 is formed on an insulating substrate 1. Next, the ion plating of SiO2, SiO or Al2O3 is performed using a vapor deposition mask to selectively form a projected film 6 only on a region forming a heat generating part 7. Further, a heat generating resistor film 3 and an electrode film 4 are deposited from above by sputtering and the electrode film 4 is removed in a required pattern by photoetching to form the required heat generating part 7. Further, SiO2, SiO, Al2O3, Ta2O5, SiC or Si3N4 is deposited on the surface of said part 7 to form a protective film 5. By forming the convex film 6 so as to make the same thicker than the electrode film 4, the contact of the heat generating part 7 with a ribbon or printing paper becomes well and the heat efficiency of a thermal head is improved and printing quality is enhanced. |
