发明名称 Graded gap semiconductor optical device
摘要 A variable temperature method for the preparation of single and multiple epitaxial layers of single-phase (e.g., face-centered cubic), ternary lead chalcogenide alloys (e.g., lead cadmium sulfide [Pb1-wCdw]a[S]1-a wherein w varies between zero and fifteen hundredths, inclusive, and a=0.500+/-0.003), deposited upon substrates of barium fluoride, BaF2, maintained in near thermodynamic equilibrium with concurrently sublimated lead alloy and chalcogenide sources. During preparation, the temperature of the substrate is varied, thereby providing an epilayer with graded composition and predetermined electrical and optical properties along the direction of growth. This growth technique can be used to produce infrared lenses, narrowband detectors, and double heterojunction lasers.
申请公布号 US4371232(A) 申请公布日期 1983.02.01
申请号 US19800143695 申请日期 1980.04.25
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY 发明人 JENSEN, JAMES D.;SCHOOLAR, RICHARD B.
分类号 C30B23/00;C30B23/04;H01L31/032;H01L31/065;(IPC1-7):H01L27/14;G02B1/02 主分类号 C30B23/00
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