发明名称 PREPARING METHOD AND DEVICE FOR THIN FILM
摘要 PURPOSE:To obtain a simultaneous evaporation film, a diffused-particle plasma polymerization film and a lamination film in a short time, by rotating substrates in a vessel having chambers partitioned by a partition plate. CONSTITUTION:Substrates are set on a holder 22, while air in a polymerizing vessel 21 is exhausted to a desired degree of vacuum. The holder 22 is rotated so that it traverses each chamber at a constant speed. A monomer gas is introduced from an inlet 215 into the vessel, a high frequency is applied to a coil 25, and thereby plasma polymerization is started. Then a material to be evaporated is put in the evaporation boat 26 and evaporated. While a thin film being formed, the thickness thereof is measured by means of measuring heads 213 and by the light reflection from a reflector 214, and thereby the thin film in the prescribed thickness is prepared. When operations are made independently, a evaporation film and a plasma film are formed, and when they are done simultaneously, a plasma polymerization film with diffused evaporation particles can be formed. When they are conducted simultaneously in two kinds of different boats, a simultaneous evaporation film can be made on the substrate. According to this constitution, various films can be formed simply and rapidly, and also the lamination thereof is enabled.
申请公布号 JPS5814540(A) 申请公布日期 1983.01.27
申请号 JP19810110840 申请日期 1981.07.17
申请人 NIPPON DENSHIN DENWA KOSHA 发明人 MORINAKA AKIRA;YAMAZAKI HIRONORI;ASANO YOSHIHIRO;TSUJIYAMA BUNJIROU
分类号 H01L21/205;B05D7/24;C23C14/06;H01L21/203 主分类号 H01L21/205
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