| 摘要 |
<p>A method of treating the surface of substrates used in liquid crystal display cells so that the surface forces the liquid crystal director to be aligned uniformly over the entire surface and parallel to the substrate surface. The method includes the step of forming a plasma beam containing oxygen free-radicals, inert gas free-radicals such as argon, neon and helium, and free radicals of a compound containing the element to be deposited, for example, silicon, tin, indium, etc. Preferably a volatile organo-silicon or an organo-tin compound is used to supply the silicon or tin. The plasma beam is then directed at the substrate surface at an angle, preferably of about 30 DEG , for a time sufficient to deposit a film. The liquid crystal display cell utilizing a substrate formed in this manner has a high contrast ratio as well as a sharp threshold in its electro-optical characteristics.</p> |
