发明名称 Reduced source capacitance ring-shaped IGFET load transistor in mesa-type integrated circuit
摘要 A self-aligned polysilicon gate depletion-type n-channel IGFET serving as a load transistor in a mesa-type integrated circuit having a P+ field region surface. The gate is ring-shaped and surrounds the IGFET source region. The source region does not intersect a mesa edge. The gate overlaps mesa edges to reduce peripheral capacitance.
申请公布号 US4370669(A) 申请公布日期 1983.01.25
申请号 US19800169527 申请日期 1980.07.16
申请人 GENERAL MOTORS CORPORATION 发明人 DONLEY, WILLIAM B.
分类号 H01L29/423;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/423
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