发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain a photosensitive resin composition not restrained in photohardening reaction even when it is exposed to light in the air, by incorporating a vinyl copolymer of a specified (meth)acrylate and a radically polymerizable monomer, a multifunctional olygomer, and a photosensitizer. CONSTITUTION:A resin composition contains (A) a vinyl copolymer composed of 10-70wt% (meth)acrylate having a cyclic unsaturated group represented by formulaIin which R1 is H or CH3; R2 is formula II, III, or IV; R3 is H or CH3; m is 0-6; and when m=1, n=2-5, and when m=2-6, n=2: and 30-90wt% radically polymerizable monomer as constituent units, (B) a multifunctional olygomer containing a vinyl group in the terminal of the molecule, and (C) a photosensitizer. As the (meth)acrylate to be used having the cyclic unsaturated group, 8(9)-acryloxytricyclo[5.2.1.0<2.6>]-4-decene, etc. are embodied.
申请公布号 JPS5810737(A) 申请公布日期 1983.01.21
申请号 JP19810109840 申请日期 1981.07.13
申请人 SEKISUI KAGAKU KOGYO KK 发明人 YANAGISAWA KUNIO;NAKAGAWA TAKASHI;KAWASAKI YASUHIRO
分类号 C08L33/02;C08L33/00;C08L33/04;C08L33/06;G03F7/033;G03F7/038 主分类号 C08L33/02
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