| 摘要 |
PURPOSE:To obtain a negative plate of good quality when has a pit of desired size by monitoring the depth and size of the pit during development processing, then stopping the development processing once the depth and size attain the prescribed range. CONSTITUTION:A negative plate 2 after development processing is mounted on a turntable 3 in a processing tank 1, and the turntable is slanted at a prescribed angle theta and rotated. The photoresist film of the negative plate 2 is sprayed with a developer through a nozzle 6. A laser light source 8 is provided outside of the tank to irradiate the negative plate 2 with laser light slantingly at the prescribed angle. The intensity of the laser light diffracted at a pit position of the resist film is detected by a photoelectric converter 12 and when the detected value reaches a prescribed value, a valve 5 is closed to stop the development. Consequently, a negative plate of good quality with a pit of desired size is obtained because the extent of the development is adjusted on the basis of the intensity of the diffracted light. |
