| 摘要 |
<p>PURPOSE:To produce a smaller MIM element easily, by injecting oxygen ions into a metallic layer with oxygen ion beams whose diameter is reduced up to <=1,000Angstrom after forming the single metallic layer on a glass plate. CONSTITUTION:A metallic layer is adhered onto a glass plate 4 where a data line, an MIM element, and a display cell driving electrode should be constituted. This metallic layer is patterned as shown by A in figure by etching. Next in case that an insulating layer of the MIM element is formed in this metallic thin film, an ion implanting device is used first to implant oxygen ions to regions 10 in figure. At this time, it is desirable that the diameter of oxygen ion beams is <=1,000 deg.C, and the implanting energy is so controlled that the concentration of oxygen is maximum in the approximate center of the metallic layer 10 in the direction of tickness. After implanting oxygen to the metallic layer 10, metals in regions, where oxygen is implanted are converted oxides by heating due to a heater, a laser, or the like, thus forming the insulating layer of the MIM element.</p> |
