| 摘要 |
PURPOSE:To largely reduce the number of steps during the production of an original plate by selecting a necessary pattern for an exposure from original plate patterns, and irradiating only selected pattern with an optical beam by scanning means to form a circuit pattern on a photosensitive material. CONSTITUTION:An opening controller 12 receives a control signal corresponding to the size and shape of a pattern selected from a central processing unit 11 to drive a variable opening mechanism 2 and controls the opening, i.e., the size and shape of an optical beam to be adapted for the selected pattern. A scan controller 13 receives a control signal responsive to the position of the selected pattern from the unit 11, controls to drive a scanning mechanism 5, and irradiates the selected pattern with the beam to project only the pattern on a wafer 9. Thus, a plurality of original plate patterns having high universality are formed on an original plate 7, necessary pattern is selected from the original plate patterns to form a circuit pattern on a photosensitive material 9. Accordingly, the number of steps can be largely reduced. |
