| 摘要 |
PURPOSE:To measure the characteristics of a microcolor filter laminated actually on a wafer in its non-destructive state, by comparing the output before and after formation. CONSTITUTION:Before a microcolor filter MCF is formed on a silicon wafer Si, white lights 2 are irradiated uniformly on the wafer Si and its output is stored in a computor CPU. An output of each picture element is measured and stored by a self scanning of the wafer Si. After the filter MCF is directly formed on the wafer Si, the white lights 2 are exposed again and the output is inputted to the computor CPU. When this output is compared with the measured value stored before forming, the transmittance of the microcolor filter MCF is investigated indirectly. |
