| 摘要 |
PURPOSE:To obtain a positive type resist with superior sensitivity, superior dry etching resistance and high shelf stability by cross-linking a methacrylonitrile- methacrylic acid copolymer with a specified cross-linking agent. CONSTITUTION:This positive type resist is a composition consisting of a methacrylonitrile-methacrylic acid copolymer represented by the formula (where each of m and n is an integer) and a cross-linking agent contg. >=2 reactive functional groups in one molecule such as bisepoxide, bishalide or dialcohol. The resist is dissolved in a suitable solvent, applied to a substrate, and heated to a temp. at which the reaction of methacrylonitrile with methacrylic acid is not caused, whereby the high molecular chains of the copolymer are bound with the cross- linking agent to form a high molecular film having a three-dimensional structure The film is then irradiated to make only the irradiated part soluble in a developer. |
