发明名称 MANUFACTURE OF PATTERNED RESIST FILM ON SUBSTRATE
摘要 PURPOSE:To obtain the titled film while amplifying development only by electron beam irradiation by irradiating electron beams to a fluoroalkyl acrylate (co)polymer film formed on a substrate by a plasma polymn. method and by heating the film to a temp. above the glass transition point. CONSTITUTION:Fluoroalkyl acrylate represented by formulaI(where Rf is 1- 15C perfluoroalkyl or a group having >=1 F atom obtd. by substituting H for >=1 F atom in the perfluoroalkyl; R<1> is H, methyl, ethyl or halogen; and R<2> is a bivalent hydrocarbon residue), e.g., the compound of formula II or III is polymerized or copolymerized with other polymerizable substance such as ethylene or vinyl chloride by a plasma polymn. method to form a film of a fluoroalkyl acrylate (co)polymer or a mixture of a fluoroalkyl acrylate homopolymer with a homopolymer of other polymerizable substance on a substrate, and a electron beams are irradiated to the film. The film is then heated to a temp. above the glass transition point of the constituent polymer of the film under reduced pressure to manufacture the titled film.
申请公布号 JPS585735(A) 申请公布日期 1983.01.13
申请号 JP19810084093 申请日期 1981.06.01
申请人 DAIKIN KOGYO KK 发明人 HATSUTORI SHIYUUZOU;MORITA SHINZOU;FUJII TSUNEO
分类号 C08F20/00;C08F20/22;G03F7/004;G03F7/039;G03F7/16;G03F7/20;G03F7/36;H01L21/027 主分类号 C08F20/00
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