发明名称 LAPPING APPARATUS
摘要 PURPOSE:To enable the adjustment of the positional relationship of a sample and a lapping surface plate, by making the same plane as the lapping surface plate as a detection reference, and detecting the inclination of the sample thereby correcting the inclination. CONSTITUTION:The sample 5 attached to the tip of an arm 4 is positioned at the platen 6, and a laser beam from a laser beam source 10 is irradiated to the sample 5 through a collimator 11, a semi-transparent mirror 12 and an optical flat 13. Thus, if the sample 5 is inclined, interference will occur between the sample 5 and the optical flat 13 to yield interference bands. While observing the interference bands from the direction A, the arm 4 is swung up and down by operating a vertically driving mechanism (not shown) to correct the inclination of the sample 5. By setting the optical flat 13 and the surface plate 6 at the same height, the sample 5 becomes parallel with the platen 6. Thus, the positional relationship of the sample and the surface plate can be adjusted.
申请公布号 JPS584353(A) 申请公布日期 1983.01.11
申请号 JP19810096723 申请日期 1981.06.24
申请人 HITACHI SEISAKUSHO KK 发明人 OCHIAI YUUJI;TSUJI GIICHI;TAKESHITA KOUJI
分类号 B24B37/04;B24B37/30 主分类号 B24B37/04
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