发明名称 DRYING METHOD OF PLANT HAVING BASE SUCH AS LYOPHYLLUM AGGREGATUM
摘要 PURPOSE:To dry Lyophyllum aggregatum having a thick base well, by drying the Lyophyllum aggregatum at a low temperature below 40 deg.C. CONSTITUTION:Lyophyllum aggregatum is first introduced into a drying chamber in the first drying step, and heated to 25-30 deg.C, preferably 28 deg.C, at which fungi become active, and then heated slowly to 38 deg.C or above, preferably 40 deg.C, at which the fungi are destroyed for 9-10hr. In the course of the heating, the chamber is sometimes opened when the inside of the drying chamber becomes cloudy with the moisture, which is discharged to the outside by opening the chamber at times. After the lapse of 6hr or longer, preferably 9-10hr, 50-60% moisture is removed to destroy the fungal species. In the second drying step, the inside of the drying chamber is slowly heated from 40 deg.C to 50-70 deg.C, preferably 60 deg.C, for a long time to remove the remaining moisture completely and dry the Lyophyllum aggregatum uniformly in all of the pileus, stem and base thereof.
申请公布号 JPS58846(A) 申请公布日期 1983.01.06
申请号 JP19810100058 申请日期 1981.06.26
申请人 MORITA AIKO 发明人 MORITA AIKO
分类号 A23B7/02;A23B7/12;A23L19/00 主分类号 A23B7/02
代理机构 代理人
主权项
地址