发明名称 Device for recrystallisation of thin surface films or thin films deposited on substrates, by means of an electron-emission system
摘要 <p>The invention relates to a device for recrystallisation of thin surface films (2) or of thin films (2) which are deposited on substrates (1), by means of an electron-emission system, as is used, for example, in electron microscopes or electronic welding installations. In this case, the incandescent cathode (3) is constructed as a bar cathode and, for improved focusing, is surrounded by a Wehnelt electrode (4) which is formed in the shape of a symmetrical cylinder. The acceleration voltage is applied directly between the cathode (3) and the object (1, 2) which is to be recrystallised and which can move relative (see arrow 6) to the cathode (3). The device is used in the production of integrated semiconductor circuits and solar cells. <IMAGE></p>
申请公布号 DE3123628(A1) 申请公布日期 1983.01.05
申请号 DE19813123628 申请日期 1981.06.15
申请人 SIEMENS AG 发明人 KRIMMEL,EBERHARD,DIPL.-PHYS.DR.RER.NAT.
分类号 C30B11/00;H01J3/02;H01J37/063;H01J37/317;H01L31/18 主分类号 C30B11/00
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