发明名称 SUBSTRATE EXCHANGE APPARATUS
摘要 PURPOSE:To prevent the thermal deformation of a substrate holder, and eliminate the decrease of picture drawing accuracy, by providing a sample chamber, a preliminary chamber, a means to transfer a substrate, a loading and an unloading station, and connecting them via gate valves. CONSTITUTION:The title apparatus consists of; a sample chamber 1 for the drawing treatment of a substrate 4; a prelimiary chamber 5 accommodating a substrate 25 and being vacuumized; and loading and unloading stations 12, 19 having housed in a vacuum chamber, a cassette 9 capable of accommodating a plurality of substrates 4 and a means transferring said substrates 4 one by one. The sample chamber 1, the preliminary chamber 5, the loading station 12 and the unloading station 19 are connected via gate valves 3. The substrate 4 is transferred, one by one, being shifted from the cassette 9 to the substrate holder 25 in the preliminary chamber 5, and sent into the sample chamber 1. After picture drawing, the substrate holder 25 is carried back in the preliminary chamber 5, and the substrate 4 is separated from the holder 25 to be accommodated. Thus the substrate holder stays always in the vacuum chamber, so that the temperature variation can be minimized.
申请公布号 JPS62169328(A) 申请公布日期 1987.07.25
申请号 JP19860010685 申请日期 1986.01.21
申请人 TOSHIBA MACH CO LTD 发明人 NUMAGA TAKUOKI
分类号 H01J37/20;H01L21/027;H01L21/30 主分类号 H01J37/20
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