| 摘要 |
<p>Etching is carried out by applying an a.c. to Al in contact with an electrolyte contg. HCl. The wave form of the current rises rapidly from 0 to a maximum and then decreases rapidly to an intermediate value a third to a half of the maximum. Decrease to zero then occurs more slowly. The ratio of first stage time to second stage time is 1-6. Higher capacitance values of the etched Al are obtd. The process is used to increase the surface area of Al foil used for capacitor electrodes. The wave form produces higher capacitance foil than square, sinusoidal or saw-tooth wave forms. The etching process is at least 10% more efficient.</p> |
