| 摘要 |
A combined immersion/spraying process for the production, preferably, of X-ray masks, by glass etching using hydrofluoric acid. The etching section selected is to be removed completely evenly and without residues. According to the invention, the mask to be etched is immersed into an etching cassette in hydrofluoric acid, and the etching section is sprayed with hydrofluoric acid by means of a spray head. An opening in a side wall which corresponds to the area of the through-hole to be etched is provided in the etching cassette.
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