发明名称 |
COMPOUND SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE:To reduce a variation in pinch off voltage and to cut an excessive prolongation in the tailing characteristics of ID-VG by forming a layer doped in P type between a semiinsulating substrate and an active layer on the whole surface of a wafer. CONSTITUTION:In a field effect transistor using a compound semiconductor, a semiconductor layer 10 having a conductivity type opposite to that of an active layer is provided between the said semiinsulating substrate crystal 1 and the active layer 3 and electrodes 4, 5 controlling the layer 10 is provided. This can reduce a variation in pinch off voltage. |
申请公布号 |
JPS57211783(A) |
申请公布日期 |
1982.12.25 |
申请号 |
JP19810096695 |
申请日期 |
1981.06.24 |
申请人 |
HITACHI SEISAKUSHO KK |
发明人 |
UMEMOTO YASUNARI;TAKAHASHI SUSUMU;MATSUNAGA NOBUTOSHI;NAKAMURA MICHIHARU |
分类号 |
H01L21/205;H01L21/338;H01L29/80;H01L29/812 |
主分类号 |
H01L21/205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|