发明名称 COMPOUND SEMICONDUCTOR DEVICE
摘要 PURPOSE:To reduce a variation in pinch off voltage and to cut an excessive prolongation in the tailing characteristics of ID-VG by forming a layer doped in P type between a semiinsulating substrate and an active layer on the whole surface of a wafer. CONSTITUTION:In a field effect transistor using a compound semiconductor, a semiconductor layer 10 having a conductivity type opposite to that of an active layer is provided between the said semiinsulating substrate crystal 1 and the active layer 3 and electrodes 4, 5 controlling the layer 10 is provided. This can reduce a variation in pinch off voltage.
申请公布号 JPS57211783(A) 申请公布日期 1982.12.25
申请号 JP19810096695 申请日期 1981.06.24
申请人 HITACHI SEISAKUSHO KK 发明人 UMEMOTO YASUNARI;TAKAHASHI SUSUMU;MATSUNAGA NOBUTOSHI;NAKAMURA MICHIHARU
分类号 H01L21/205;H01L21/338;H01L29/80;H01L29/812 主分类号 H01L21/205
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