REMOVAL OF H2S AND CO2 FROM GASES

摘要

The present invention deals with a process for removal of H2S and CO2 from a gas mixture in which: (a) the gas mixture is contacted at elevated pressure countercurrently with lean solvent which comprises a tertiary amine and a physical absorbent; (b) the loaded solvent obtained is flashed; (c) the flash gas set free in step (b) is contacted countercurrently with lean solvent under conditions which are selective for H2S removal; (d) part of the loaded solvent obtained after flashing is stripped with the gas obtained in step (c); (e) the stripped solvent obtained in step (d) is introduced as semilean solvent in step (a); (f) the gas obtained in step (d) is contacted countercurrently with lean solvent under conditions which are selective for H2S removal; and (g) loaded solvent obtained in steps (c), (b) and (f) is regenerated to yield lean solvent, wherein a gas with an H2S concentration suitable to be used in a Claus process is obtained.