| 摘要 |
PURPOSE:To facilitate sectional shape control and to form a rough surface which has numbers of sharp projections and recesses by forming a thin film type mask which has numbers of fine projections and recesses (including pores) on its surface on the surface to be roughened and etching this surface to be roughened by an ion beam etching method. CONSTITUTION:The thin film type mask which has numbers of the projections and recesses on its surface is formed on the surface to be roughened. Then the surface where the mask is formed is etched by the ion beam etching method to roughen the object surface. Consequently, the roughened surface consisting of projections and recesses of constant etching depth in sharp shapes is formed. In this case, the direction and quantity of incidence of an ion beam are controlled to vary the projection shapes easily and variously according to the purpose of use. |
