发明名称 RESIST DEVELOPING APPARATUS
摘要 PURPOSE:To eliminate wasteful use of a developer, by providing inside a developer supply device a device for maintaining the developer at a constant temperature, and providing the developer supply device with a device for intermittently supplying the developer. CONSTITUTION:A substrate supporting device 1 has a disc shape and is rotatable about a shaft 11 within a horizontal plane as well as movable in the vertical direction. A substrate 2 to be developed is secured to the substrate supporting device 1 by means of a vacuum chuck or the like. A developer supply device 5 has its lower surface 6 facing the upper surface of the substrate 2 with a distance of about 1mm. provided therebetween and is made of a porous material allowing a developer to permeate therethrough. The device 5 has therein a constant temperature device 7 for maintaining the temperature of the developer constant, e.g. at about 25 deg.. The device 5 is provided with a device for intermittently supplying the developer, e.g., a valve 8.
申请公布号 JPS57208134(A) 申请公布日期 1982.12.21
申请号 JP19810094288 申请日期 1981.06.18
申请人 FUJITSU KK 发明人 SUETAKE MIKIO
分类号 H01L21/30;G03F7/30;H01L21/027;(IPC1-7):01L21/30 主分类号 H01L21/30
代理机构 代理人
主权项
地址