| 摘要 |
PURPOSE:To produce a thin film magnetic head in an easy way with high accuracy of the gap depth, by first forming the first thin 2nd insulated layer to give the etching to it and then forming an etching stopper at an area having a prescribed gap depth to form the second 2nd insulated layer. CONSTITUTION:The 1st magnetic layer 21 is formed on a substrate 1, and the 1st insulated layer 5 and then an electrode coil 3 are formed on the layer 21. Then the 2nd insulated layer is formed on the layer 21. In this case, the first 2nd insulated layer 61 is formed with a thickness smaller than a desired value, and the extra part of the layer 5 is etched to secure the distance l2 to the coil 3. Then an etching stopper 7 is formed at the area where a gap is formed, and then the second 2nd insulated layer 62 is formed. The total thickness of both layers 61 and 62 is set at the desired value. Thereafter, the 2nd magnetic layer 22 is formed on the layer 62. Thus the gap depth l1 of a thin film magnetic head can be secured in an easy way with sufficiently high accuracy. |
