| 摘要 |
PURPOSE:To accurately and simply control the concentration, temperature and the like of a developer to be sprayed, by a method wherein a resist developer spray nozzle is constituted by a double-pipe nozzle, and the inner pipe thereof is used for supplying the developer, while the outer pipe thereof is used for supplying the spray air. CONSTITUTION:A substrate supporting device 1 holds on the upper surface thereof a substrate 2 having on the surface thereof an exposed resist film to be developed and supports the substrate 2 substantially horizontally as well as rotatably. A developer supply pipe 5 is provided with a valve 6 for permitting an intermittent supply. In this case, the pipe 5 has a double-pipe structure. The inner pipe 7' is used for supplying a developer, while the outer pipe 7'' is used for supplying the spray air. |
