发明名称 TREATMENT OF RESIDUAL LIQUID IN CRYOGENIC LIQUEFIED GAS TANK
摘要 <p>PURPOSE:To enable to discharge residual liquefied gas in a short time by a method wherein the residual liquefied gas is led through a piping communicating to the bottom of a low pressure tank into a pressure vessel and, after that, fed from the pressure vessel to a predetermined portion by means of the pressure of gas applied to the pressure vessel. CONSTITUTION:The exhaustion of the residual liquefied gas in the tank 1 is performed as follows: Firstly, a low level signal is issued from a liquid level detector 19 and a pressure detector 20 by switching-on in order to close controlling valves 10 and 16 and to open a controlling valve 5. Thereupon, the residual liquefied gas 2 in the tank 1 is led by its own weight a drain pipe 3 into the pressure vessel 4. Secondly, pressurized gas is supplied from a pressurized gas supply unit through a piping 8 into the pressure vessel 5. As a result, the liquefied gas 2 in the pressure vessel 4 is fed through a piping 12 to an evaporator 13 by means of the pressure of said pressurized gas supplied to the pressure vessel 4.</p>
申请公布号 JPS57208397(A) 申请公布日期 1982.12.21
申请号 JP19810095113 申请日期 1981.06.19
申请人 ISHIKAWAJIMA HARIMA JUKOGYO KK 发明人 NOGUCHI NOBUHISA
分类号 F17C9/02;F17C9/00 主分类号 F17C9/02
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